DaON-1000S
DaON-S series
[RF/DC Magnetron Co-Sputter]
SPECIFICATION
| Substrate size | Max. Ø 2inch Single or piece |
|---|---|
| Substrate mechanism |
Rotation(Max. 20rpm) / Heating(Max.650℃) |
| Sputtering type | Co-sputtering |
| Target size | Ø 2inch x 1/4” or 1/16” thickness |
| Power supply |
DC 1 kW (600VDC, 1set) RF 300W (13.56MHz, 2sets) |
| Pumping unit |
Rotary pump(600L/min) + TMP (1,600L/sec) |
| Base pressure | ＜ 5x10-6 Torr |
| Process gauge | CDG (upto 2torr) |
| Vacuum gauge | Pirani gauge(2ea) / Ion gauge(1set) |
| Gas flow | N2, O2, Ar |
| System control | PLC + Touch |
| Dimension | 1400W x 1794H x 1000D |