Reactor | Quartz tube |
---|---|
Graphite susceptor | |
Sample size | Max. 4inch single wafer |
Furnace | Hot wall resistance heater |
3-Zone heating control (Uniform zone: 300mm) |
|
Max. Temp.: 1,000℃ | |
Mounting position movable | |
Horizontally opened furnace | |
RF plasma (option) |
Adjustable distance between working coil and sample |
Gas | Gas leak detection module |
Base pressure | 9x10-4 Torr |
Operating pressure | Up to several hundred mmTorr |
Pumping | Scroll pump (80m3/h)+ Booster pump(500m3/h) |